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Intersil啟用位於中國杭州的新設計中心(英文內容)
(技術新聞, 2008年3月19日)
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Intersil Corp. has opened a new Design & Application Center in Hangzhou, China, which will develop reference designs and provide system level application support for the company's growing customer base in the region. The new design center is part of Intersil's ongoing strategy to increase its investment and footprint in the Chinese market, and better serve the growing number of Chinese companies that are designing products requiring Intersil's high-performance analog ICs.
The center will provide customers with a range of value added services, along with Intersil's broad range of high-performance analog solutions, based on specifications including form factor, power requirements, preferred peripheral components, time to market, price and other factors.
Another primary focus of the center will be ongoing collaboration with the Joint Power Management Laboratory that Intersil established in late 2007 at Zhejiang University, also based in Hangzhou.
Intersil is one of the leaders in the design and manufacture of high-performance analog semiconductors.
Click here for more information on Intersil
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